Polycrystalline silicon (Si) target
Used as components in devices such as CVD equipment, annealing furnaces, and diffusion furnaces! Polycrystalline silicon materials suitable for applications requiring high purity and thermal properties!
■ Purity > 99.9999% ■ Density (2.33/cm³) ■ Manufacturing methods: Melting method and sintering method *For more details, please download the PDF or feel free to contact us.
- Company:スパッタコア
- Price:Other